ICALEO 2008 Paper #M1101 (A Detailed Study of the Mechanism of Rapid Laser Patterning of Indium Tin Oxide Thin Films)
ICAL08_M1101
$28.00 (USD)
Members: $25.00 (USD)
This electronic document is sold as a single-user document. You are required to accept the End-User License Agreement prior to download. For site license inquiries, please contact the LIA.
A Detailed Study of the Mechanism of Rapid Laser Patterning of Indium Tin Oxide Thin Films
Authors:
Paul M. Harrison, Powerlase Ltd; Crawley Great Britain
Nick Hay, Powerlase Ltd; Crawley Great Britain
Duncan Hand, Heriot-Watt University; Edinburgh Great Britain
Jozef Wendland, Heriot Watt University; Edinburgh Great Britain
Presented at ICALEO 2008
The process of rapid laser patterning (RLP) of ITO thin films on glass has been adopted into mass production by the flat panel displays industry. This process involves high speed selective removal of thin films for the manufacture of transparent electrode structures and uses high average power, high peak power, nanosecond pulse duration Nd:YAG DPSS lasers. In this paper the laser patterning process and removal mechanism are described in detail with consideration given to how laser pulse characteristics influence features of the process. Subsequent issues such as the effect of the laser ablation plume, debris, substrate heating and redeposition of ITO residue are also considered.
